A Laser Technique Could Improve Electronics Seattle WA

This novel process might lead to purer silicon -- and faster chips.

Local Companies

EnviroIssues, Inc.
(206) 269-5041
101 Stewart St.,
Seattle, WA
Avanade
(206) 239-5600
2211 Elliott Ave
Seattle, WA
Bell Harbor International Conference Center
(206) 441-6666
2211 Alaskan Way,
Seattle, WA
Evergreen Computer Products
(206) 624-3722
2720 1st Ave. S.
Seattle, WA
United Rentals Inc
(206) 267-2149
720 South Forest Street
Kenmore, WA
Khmmixay Computer Plus LLC
206 218 8802
3230 Rainier Ave. South Suite 4
Seattle, WA
Khammixay Computer Plus LLC.
206 218 6602
3230 Rainier ave. South Suite 4
Seattle, WA
GMMB
(206) 352-8598
1200 Westlake Ave.
Seattle, WA
Eqqus Technologies
(425) 558-3500
1725 Westlake Ave. N,
Seattle, WA
TeamLogic IT
(206) 774-0348
1607 Dexter Ave N,
Seattle, WA

provided by: 


Vanderbiltâ_Ts powerful free-electron laser is able to selectively remove hydrogen atoms from the surface of silicon, which could lead to an improved chip-making process. Light from the laser was directed into the semi-conductor processing chamber (on the left), where the experiment took place. (Credit: Neil Brake/Vanderbilt University)

A new process using lasers instead of high temperatures to remove hydrogen from silicon during the chip-manufacturing process could lead to faster semiconductors, by replacing the current technique, which often causes damage to silicon that inhibits chip speed.

Today, semiconductors are manufactured by layering silicon on a wafer, one "sheet" at a time. During this process, oxygen, which is a byproduct, can collect between the silicon layers -- which ruins the chip. To prevent that from happening, hydrogen is added to the silicon as a protective coating. While it solves the oxygen issue, the step has its own, albeit lesser, drawback: before the next layer of silicon can be added, the hydrogen must be removed, in a process that currently requires heating the chip to around 800 degrees Celsius. This heating creates defects in the silicon that keep chips from performing at their optimal speeds.

This new laser process, which can target and selectively remove molecules without heating the silicon, could replace the heating step, says Norman Tolk, physics professor at Vanderbilt University, and one of the researchers on the project. "The more you heat [silicon], the more you put it in a hostile environment," he says. Ideally, the chip-making process should be done with temperatures that are as low as possible, he says.

In a hydrogen-silicon bond, the energy required to break the bond corresponds to infrared light with a wavelength of 4.8 micrometers. The researchers adjusted their extremely powerful laser (called a "free electron laser") to emit a beam at this wavelength, and bathed the silicon-hydrogen bonds with the light. The laser's energy caused the bonded atoms to bounce back and forth, as if on a spring, until the vibrations grew large enough to break the bonds.

By Kate Greene

Read article at techreview.com

Featured Local Company

EnviroIssues, Inc.

(206) 269-5041
101 Stewart St.,
Seattle, WA
http://www.enviroissues.com/

Related Local Events
REAL-TIME & EMBEDDED COMPUTING CONFERENCE - SEATTLE
Dates: 10/29/2009 - 10/29/2009
Location: Seattle Center
Washington, WA
View Details

Pacific Northwest Apparel Association Seattle Trend Show - June 2009
Dates: 6/6/2009 - 6/9/2009
Location: Greater Tacoma Convention & Trade Center
Tacoma, WA
View Details